首页> 外文会议>International Nano-Optoelectronics Workshop >Effect of Ar / O2 gas flow ratio on photocatalytic efficiency of TiO2 films prepared by DC magnetron sputtering

【24h】

Effect of Ar / O2 gas flow ratio on photocatalytic efficiency of TiO2 films prepared by DC magnetron sputtering

机译：AR / O2气体流量比DC磁控溅射制备的TiO2薄膜光催化效率的影响

获取原文

获取外文期刊封面目录资料

页面导航

摘要
著录项
引文网络
相似文献
相关主题

摘要

Nanometer polycrystalline anatase TiO2 films were prepared by DC magnetron sputtering after annealing. Photocatalytic experiment reveals that the sample deposited under lower Ar/O2 gas flow ratio shows better degradation activity.

机译：通过退火后的DC磁控溅射制备纳米多晶锐钛矿TiO 2膜。光催化实验表明，在较低的Ar / O 2气体流量下沉积的样品显示出更好的降解活性。

著录项

来源
《International Nano-Optoelectronics Workshop》|2007年||共2页
会议地点
作者
Lin Zhao; Liping Lv; Qiu Jiawen;
展开▼
作者单位

展开▼
会议组织
原文格式 PDF
正文语种
中图分类 TP241-53;
关键词

相似文献

外文文献
中文文献
专利

1. Photocatalytic efficiency of TiO2/SnO2 thin film stacks prepared by DC magnetron sputtering [J] . Kanai N, Nuida T, Ueta K, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2004,第3a4期

机译：直流磁控溅射制备TiO2 / SnO2薄膜叠层的光催化效率
2. Effect of the nitrogen-oxygen ratio on the position of N atoms in the TiO2 lattice of N-doped TiO2 thin films prepared by DC magnetron sputtering [J] . Wu Haihua, Yang Dingyu, Zhu Xinghua, CrystEngComm . 2018,第29期

机译：氮氧比对DC磁控溅射制备的N掺杂TiO2薄膜的N原子位置的影响
3. Photocatalytic Zn-doped TiO2 films prepared by DC reactive magnetron sputtering [J] . Zhang WJ, Zhu SL, Li Y, Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2007,第3期

机译：直流反应磁控溅射制备光催化掺杂锌的TiO2薄膜
4. Effect of Ar / O2 gas flow ratio on photocatalytic efficiency of TiO2 films prepared by DC magnetron sputtering [C] . Lin, Zhao, Liping, . 2007

机译：氩气/氧气流量比对直流磁控溅射制备TiO2薄膜光催化效率的影响。
5. The deposition and characterization of high dielectric constant films prepared by pulsed reactive DC magnetron sputtering technique. [D] . Kim, Jin-Young. 2000

机译：脉冲反应直流磁控溅射技术制备的高介电常数薄膜的沉积和表征。
6. High-rate low-temperature dc pulsed magnetron sputtering of photocatalytic TiO2films: the effect of repetition frequency [O] . J Šícha, D Heřman, J Musil, 2007

机译：TiO2光催化薄膜的高速低温直流脉冲磁控溅射：重复频率的影响
7. Effect of substrate sodium content on crystallization and photocatalytic activity of TiO2 films prepared by DC magnetron sputtering [O] . Tomaszewski Henryk, Eufinger Karin, Poelman Hilde, 2007

机译：底物钠含量对直流磁控溅射制备TiO2薄膜结晶和光催化活性的影响

Effect of Ar / O2 gas flow ratio on photocatalytic efficiency of TiO2 films prepared by DC magnetron sputtering

摘要

著录项

引文网络

相似文献

相关主题

期刊订阅