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Using MALDI Depth Profiles to Understand the Effect of ESD Sample Preparation Parameters on MALDI IMS Samples

机译:使用MALDI深度配置文件来了解ESD样品制备参数对MALDI IMS样品的影响

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The use of depth profiles allows for characterization of a sample in terms of what sections of the matrix layer produce signal, the amount of that signal, and the rate (in terms of laser shots) at which that signal can be obtained. This allows for collection of the maximum amount of signal while limiting the analysis time and damage to the sample (limiting scarring from the laser and exposure to the vacuum) if multiple analyses are required from a particular sample. These gains would not be limited to matrix application by ESD, but should be valuable for most matrix application techniques. By evaluating the efficacy of a matrix application method on analytes with a range of properties, it is possible to determine what types of analytes can be properly imaged with a given method. Since a wide variety of analytes can be applied using the methods presented here, a wide range of properties can be evaluated for compatibility with a particular matrix application method. Through the collection and analysis of depth profiles for samples prepared by independently applying analyte and matrix, significant information has been obtained about the distribution of analyte signal through the matrix layer in addition to the effects of varying parameters of matrix application using ESD. The results suggest that the crucial aspects that affect the amount of signal obtained are the amounts of matrix and analyte and the ratio of the two, which is supported by previous work within the Owens group [3,4,11]. The requirement for incorporation results in the amount and composition of the solvent present upon deposition to be a crucial aspect of matrix application. Future work will be performed to further understand these aspects of matrix application in order to increase the utility of ESD for preparing samples for imaging.
机译:使用深度轮廓允许在矩阵层产生信号的哪些部分,该信号的量和速率(在激光镜头方面)的术语中表征样本。这允许收集最大信号量,同时限制分析时间和对样品的损坏(限制来自激光和暴露于真空的疤痕),如果需要多次分析,则特定样品需要多次分析。这些增益不限于ESD的矩阵应用,但对于大多数矩阵应用技术应该是有价值的。通过评估矩阵施加方法对具有一系列性质的分析物的疗效,可以确定可以用给定方法适当地成像的分析物类型。由于可以使用这里呈现的方法施加各种分析物,因此可以评估各种特性以与特定矩阵施加方法的兼容性。通过对通过独立施加分析物和基质制备的样品的深度谱的收集和分析,除了使用ESD的改变参数的影响外,还通过基质层分布了分析物信号的显着信息。结果表明,影响所得信号量的至关重要方面是基质和分析物的量,两者的比例是由欧文斯组的先前工作支持的两者的量[3,4,11]。掺入的要求导致在沉积时存在的溶剂的量和组合物是基质施用的关键方面。将来将进行未来的工作以进一步了解矩阵应用的这些方面,以便增加ESD的效用以准备成像的样品。

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