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Growth mechanism of ZnSe single crystal by chemical vapour transport method

机译:化学蒸汽运输方法ZnSE单晶的生长机理

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We attempted to grow ZnSe single crystals by the chemical vapour transport (CVT) method using the source material with different particle diameters. The purpose of this study is to examine the dependence the growth mechanism on the source particle diameter. We observed surface topographies of grown single crystals using the ultra-high vacuum atomic force microscopy (UHV-AFM) and investigated the growth mechanism. Dislocation densities were determined from etch pit density counts. It can be seen that the transport rate is decreasing with the increase in the source particle diameter. In the case of decreasing in the transport rate, transported atoms diffuse easily on the grown surface. Moreover, it turned out that the growth mechanism changed to the two-dimensional growth from the three-dimensional growth because the transport rate decreased. The average value of EPD of 3.0 x 10~3 cm~(-2) was obtained. We found that control of the source particle diameter is important for preparing high-quality ZnSe single crystals.
机译:我们试图通过使用具有不同粒径的源材料来通过化学蒸汽传输(CVT)方法来种植单个晶体。本研究的目的是检查生长机制对源粒径的依赖性。我们使用超高真空原子力显微镜(UHV-AFM)观察到生长的单晶的表面地形,并研究了生长机制。从蚀刻坑密度计数确定位错密度。可以看出,随着源粒径的增加,运输速率降低。在运输速率下降的情况下,运输的原子容易在生长的表面上弥漫。此外,结果,由于运输速率降低,增长机制变为三维生长的二维生长。获得3.0×10〜3cm〜(-2)的EPD的平均值。我们发现控制源粒径的控制对于制备高质量的ZnSe单晶是重要的。

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