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Electrodeposition of Tin from 1-Methyl-3-ethylimidazolium chloride/AlCl{sub}3/SnCl{sub}2 Room Temperature Molten Salts

机译:锡的电沉积来自1-甲基-3-乙基咪唑氯/ ALCL {SUB} 3 / SNCL {SUB} 2室温熔盐

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The electrodeposition of tin was investigated in the room temperature molten salt based on 1-methyl-3-ethylimidizalium/AlCl{sub}3/SnCl{sub}2. The results show that the morphology and size of the tin crystallites are strongly influenced by the composition of the melts and the deposition potentials, producing tin deposits with different shapes and widely various size ranges from several micrometers to nanometers. Double potentiostatic pulse deposition technique has been used to control the morphology and particle size of tin deposits. Nano-size tin particles around 50 nm with more regular shape and uniform size distribution can be obtained successfully by a balanced control of the nucleation and growth of the tin deposits.
机译:基于1-甲基-3-乙基咪唑鎓/ ALCL {SUB} 3 / SNCL {SUB} 2,在室温熔盐中研究了锡的电沉积。结果表明,锡微晶的形态和尺寸受熔体组成和沉积电位的影响,产生具有不同形状的锡沉积物,广泛的各种尺寸从几微米到纳米。双电位脉冲沉积技术已用于控制锡沉积物的形态和粒径。纳米型锡颗粒具有更规则的形状和均匀尺寸分布的纳米型锡颗粒可以通过平衡控制锡沉积物的核心和生长来成功获得。

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