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EFFICIENT CALCULATION OF LIFETIME BASED DIRECT TUNNELING THROUGH STACKED DIELECTRICS

机译:基于堆叠电介质的寿命直接隧道的高效计算

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We present an efficient simulation method for lifetime based tunneling in CMOS devices through layers of high-ic dielectrics, which relies on the precise determination of quasi-bound states (QBS). The QBS are calculated with the perfectly matched layer (PML) method. Introducing a complex coordinate stretching allows artifical absorbing layers to be applied at the boundaries. The QBS appear as the eigenvalues of a linear, non-Hermitian Hamiltonian where the QBS lifetimes are directly related to the imaginary part of the eigenvalues. The PML method turns out to be a numerically stable and efficient method to calculate QBS lifetimes for the investigation of direct tunneling through stacked gate dielectrics.
机译:我们通过高IC电介质层介绍了基于CMOS器件的终身隧穿的高效仿真方法,这依赖于准束状态(QBS)的精确确定。用完美匹配的层(PML)方法计算QB。引入复杂坐标拉伸允许在边界处施加人工吸收层。 QBS显示为线性,非私人汉密尔顿人的特征值,其中QBS寿命与特征值的虚部直接相关。 PML方法证明是一种数值稳定和有效的方法,用于计算通过堆叠栅极电介质的直接隧道的终身寿命。

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