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Composite Ag-Ni metal mesh based transparent conductive film for electromagnetic interference shielding application

机译:基于复合Ag-Ni金属网的电磁干扰屏蔽应用透明导电膜

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With the development of wireless microwave electronic devices, electromagnetic interference (EMI) is a new kind of pollution that is becoming increasingly prevalent and has affected the performance of the electronic devices and the human health. Thus, the transparent EMI shielding film is a key component for many practical applications. Conventional methods for the fabrication of transparent EMI film are time-consuming and costly for their employing expensive vacuum-based process. By combination of the scrape and selective electroplating techniques, a vacuum sputtering/evaporation-free processing is explored for the fabrication of high-performance metal mesh based TCF. The fabricated composite Ag-Ni mesh TCF exhibits ultra-low sheet electrical resistance (Rs=0.07Q sq-1) at average transmittance of 70% in the visible region. The measured shielding efficiency can be greater than 30dB in X-band. Both experimental and theoretical results are given in the paper. By using the proposed method, TCF based EMI film can be easily fabricated for mass-manufacturing.
机译:随着无线微波电子设备的开发,电磁干扰(EMI)是一种新的污染,变得越来越普遍,并影响了电子设备和人类健康的性能。因此,透明的EMI屏蔽膜是许多实际应用的关键部件。用于制造透明EMI膜的常规方法是耗时的,并且对于采用昂贵的基于真空的工艺昂贵且昂贵。通过刮擦和选择性电镀技术的组合,探讨了真空溅射/蒸发的加工,用于制造高性能金属网的TCF。制造的复合Ag-Ni网TCF在可见区域中的平均透射率为70%的平均透射率在70%的情况下表现出超低板电阻(Rs = 0.07Q SQ-1)。测量的屏蔽效率可以大于X波段的30dB。本文给出了实验和理论结果。通过使用所提出的方法,可以容易地制造基于TCF的EMI膜以进行大规模制造。

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