Effect of SiO{sub}2 Cap Layer on Thermal Stability of Nickel and Nickel-Cobalt Silicide

摘要

We investigated the effect of SiO{sub}2 cap layer on the thermal stability of nickel and nickel-cobalt silicide by measuring its sheet resistance. The stability of nickel silicide was deteriorated as a function of annealing temperature, while that of nickel-cobalt silicide was not. In case of both silicides, the SiO{sub}2 cap layer improved the stability. Tensile stress from the difference of thermal expansion coefficients between SiO{sub}2 and nickel silicide may suppress the agglomeration of nickel silicide.