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Compositional dependencies of ferromagnetic Ge_(1-x)Mn_xTe grown by solid-source molecular-beam epitaxy

机译:固体源分子束外延生长的铁磁性GE_(1-X)MN_XTE的组成依赖性

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The IV-VI diluted magnetic semiconductor Ge_(1-x)Mn_xTe thin films on BaF_2 (111) substrate have been prepared using solid-source molecular-beam epitaxy technique by varying the Mn concentrations from x=0.25 to 0.98. The chemical Mn concentration was determined by x-ray photoelectron spectroscopy measurement. The in situ reflection high-energy electron diffraction pattern indicates that the growth mechanism is in the island-growth mode. The x-ray diffraction shows that the Ge_(1-x)Mn_xTe films crystallize in the NaCl phase with (111) orientation. A clear ferromagnetic ordering is observed in the detailed temperature-dependent magnetization measurement for 0.25
机译:通过从x = 0.25至0.98的Mn浓度改变,使用固体源分子束外延技术制备BAF_2(111)衬底上的IV-VI稀释的磁半导体Ge_(1-x)Mn_xte薄膜。通过X射线光电子光谱测量测定化学Mn浓度。原位反射高能电子衍射图表明生长机制处于岛生长模式。 X射线衍射表明,GE_(1-X)MN_XTE膜在NaCl相中结晶(111)取向。在详细的温度依赖性磁化测量中观察到澄清的铁磁性排序0.25

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