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(07D714) Thickness dependence of critical current density in GdBa_2Cu_3O_(7-δ) thin films with BaSnO_3 addition

机译:(07D714)GDBA_2CU_3O_(7-Δ)薄膜缩小电流密度的厚度依赖性与BASNO_3添加

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We investigated influence of 4 wt. % BaSnO_3 (BSO) addition on the thickness dependence of critical current density (J_c) of GdBa_2Cu_3O_(7-δ) (GdBCO) thin films deposited by using the pulsed laser deposition technique. The results show that J_c measured at 77 K of the GdBCO films is significantly enhanced by the addition of BSO. Thickness dependence of self-field J_c in the BSO doped GdBCO films is reduced in comparison with that of pure GdBCO films. Improved field performance of J_c is also observed for the BSO-doped GdBCO films up to thickness of 1.5 μm. The enhancements are attributed to the growth of artificial pinning centers in the form of BSO nano precipitates confirmed by the cross-sectional transmission electron microscopy images.
机译:我们调查了4重量的影响。通过使用脉冲激光沉积技术沉积的GDBA_2CU_3O_(7-Δ)(GDBCO)薄膜的临界电流密度(J_C)的厚度依赖性的%BasnO_3(BSO)添加。结果表明,通过添加BSO显着提高了在GDBCO薄膜的77 k处测量的J_C。与纯GDBCO薄膜相比,自磁场J_C在BSO掺杂的GDBCO膜中的厚度依赖性降低。对于高达1.5μm的BSO掺杂的GDBCO薄膜,也观察到J_C的改进的田间性能。增强件归因于由横截面透射电子显微镜图像证实的BSO纳米沉淀物形式的人造钉扎中心的生长。

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