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Metal-insulator transition in a transition metal dichalcogenide: Dependence on metal contacts

机译:金属绝缘体在过渡金属二甲基化物中过渡:依赖金属触点

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Transition metal dichalcogenides are promising layered materials for realizing novel nanoelectronic and nano-optoelectronic devices. Molybdenum disulfide (MoS_2), a typical transition metal dichalcogenide, has been extensively investigated due to the presence of a sizable band gap, which enables the use of MoS_2 as a channel material in field-effect transistors (FET). The gate-voltage-tunable metal-insulator transition and superconductivity using MoS_2 have been demonstrated in previous studies. These interesting phenomena can be considered as quantum phase transitions in two-dimensional systems. In this study, we observed that the transport properties of thin MoS_2 flakes in FET geometry significantly depend on metal contacts. On comparing Ti/Au with Al contacts, it was found that the threshold voltages for FET switching and metal-insulator transition were considerably lower for the device with Al contacts. This result indicated the significant influence of the Al contacts on the properties of MoS_2 devices.
机译:过渡金属二硫代甲基化物是用于实现新型纳米电子和纳米光电器件的层状材料。钼二硫化物(MOS_2),典型的过渡金属二甲基甲胺,由于存在相当大的带隙而被广泛地研究,这使得能够在场效应晶体管(FET)中使用MOS_2作为沟道材料。在先前的研究中已经证明了使用MOS_2的栅极电压可调金属 - 绝缘体转变和超导性。这些有趣的现象可以被认为是二维系统中的量子相转变。在这项研究中,我们观察到,FET几何形状中薄MOS_2薄片的运输特性显着取决于金属触点。在将Ti / Au与Al触点进行比较时,发现具有Al接触的装置的FET切换和金属 - 绝缘体转变的阈值电压显着降低。该结果表明Al接触对MOS_2器件的性能的显着影响。

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