PHASE COMPOSITION AND STRUCTURE OF NANOSCALED THERMOELECTRIC FILMS ON BASE OF CoSb3 SKUTTERUDITE

摘要

The processes of skutterudite CoSb_3 formation in nanoscaled CoSb_x(30 nm) (1.8<х<4.2) films deposited on SiO_2(100 nm)/Si(001) substrate were investigated by methods of physical materials science. After deposition the films are in x-ray amorphous state. Amorphous films crystallization occurs during annealing in temperature range of 140°C-200°C. Phase composition of nanoscaled films corresponds to Co-Sb phase diagram. At annealing higher 400°C Sb sublimation occurs and amount of СоSb_2 phase increases. More intensive process of Sb sublimation is observed at annealing of x-ray amorphous films.