首页> 外文会议>International Photovoltaic Science and Engineering Conference >Advanced Inline Quality Control (IQC) - Novel Concepts for Quality and Process Control of Crys- talline Silicon Wafer and Solar Cell Production Lines
【24h】

Advanced Inline Quality Control (IQC) - Novel Concepts for Quality and Process Control of Crys- talline Silicon Wafer and Solar Cell Production Lines

机译:先进的内联质量控制(IQC) - 新型概念,质量和过程控制的彩色硅片和太阳能电池生产线的质量和过程控制

获取原文

摘要

Quality control in solar cell production lines for a long period was focused on sun simulator testing results. Detailed analyses of the IV curve (under different illuminations and dark) give an overview of the loss mechanisms. With increase average efficiency goals for novel production lines a much more detailed analysis of every single production step is needed: Incoming quality control, inline quality control, process control and detailed classification is needed together with statistical process control to assure further improvement of efficiency, throughput, mechanical and electrical yield and product quality of solar cells and modules. The paper describes actual concepts and techniques for all of these topics, starting with wafer quality inspection by a wafer inspection system (WK). Next QC-steps are optical inspection of the etching and texturisation process followed by electrical inspection of wafers after diffusion. Optical inspection systems after ARC, printing and as final classification tool play an important role as well as μ-crack detection and stability testing. A collection (often using OPC connections) and specific sorting of all selected data via a central PC and a centralized database is finally the latest status of IQC and process control.
机译:太阳能电池生产线的质量控制长时间的重点是太阳模拟器测试结果。 IV曲线的详细分析(在不同的照明和暗区下)概述了损失机制。随着新生产线的平均效率目标,需要更详细的分析每一个生产步骤:收入质量控制,内联质量控制,加工控制和详细分类,以及统计过程控制,以确保进一步提高效率,吞吐量,太阳能电池和模块的机电收率和产品质量。本文介绍了所有这些主题的实际概念和技术,从晶圆检测系统(WK)开始于晶圆质量检测。下一个QC步骤是蚀刻和纹理过程的光学检查,然后在扩散后电气检查晶片。电弧后的光学检测系统,印刷和最终分类工具起到重要作用以及μ裂纹检测和稳定性测试。集合(通常使用OPC连接)和通过中央PC和集中式数据库对所有所选数据进行特定排序最终是IQC和过程控制的最新状态。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号