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Defect generation in high In and N content GalnNAs quantum wells: unfaulting of Frank dislocation loops

机译:高中和N内容Galnnas量子阱的缺陷产生:弗兰克错位循环的前提

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We have studied by transmission electron microscopy the defect generation in GalnNAs quantum wells when increasing the In and N contents in the range 20-35% and 1.3-2.3%, respectively. This analysis has shown the appearance of extrinsic Frank dislocation loops for In > 25%, and of threading dislocations for In=35% and N > 1.4%. It is proposed that the threading dislocations are formed from the unfaulting of the Frank loops. A new theoretical model for the process of unfaulting of extrinsic loops is proposed, which has allowed us to calculate the stacking fault energy in the GalnNAs alloy.
机译:通过透射电子显微镜研究,当增加20-35%和1.3-2.3%时,当增加IN和N含量时,通过透射电子显微镜进行缺陷产生的缺陷产生。该分析表明,用于25%的外在弗兰克错位环的外观,以及in = 35%和n> 1.4%的穿线脱位。提出,线程位错是由弗兰克环的前导形成。提出了一种新的外在环路的过程的新理论模型,使我们能够计算Galnnas合金中的堆叠故障能量。

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