Yield challenges in nanotechnology

摘要

Summary form only given. As semiconductors enter into the era of nanotechnology, fast yield ramp becomes a critical success factor for 300-mm manufacturing, enabling quick product time to market. Hence, the implementation of enhanced yield improvement techniques is essential to meet the yield challenge. This presentation covers the state-of-the-art automation, advanced integrated yield systems, in-line process control, metrology and inspection/electrical testing and enhanced physical and failure analysis techniques for Chartered Fab 7, 300-mm nanotechnology Fab. It also demonstrates the combination of intelligent automation and advanced integrated yield system capability for providing real time, fast and accurate feedback to drive yield improvement and yield prediction.