A NEW WET-DEVELOPABLE BARC FOR 248-NM APPLICATIONS

摘要

A new, wet-developable bottom anti-reflective coating (BARC) for 248-nm lithography has been prepared with a wider process window. The broader process window resulted in increased clear-out of structures and lessened post-development residue. This material also showed controllable development rates by simply changing the formulation. The material is a first minimum BARC with n and k values equal to 1.73 and 0.49, respectively, Resist compatibility was shown for both P338 and M230Y with 180-nm dense profiles at 1/1 L/S. These profiles exhibited minimal undercutting with good clearing between the lines, Clear-out has been demonstrated for 120-nm trenches and post-development residue of the material was determined to be 6 A or less at various temperatures. Sublimation testing show little sublimate from the material.