STATE OF THE ART IN TRANSISTORS

摘要

MOS transistor scaling continues to be the key enabler for improving density and performance of microprocessors and other advanced logic products. The basic MOS scaling approach, namely reducing gate oxide thickness and gate length, is no longer adequate in itself to meet today's transistor performance and power requirements New materials, structures and techniques are being incorporated in advanced logic technologies to meet a more demanding set of transistor requirements. This paper will describe transistor innovations incorporated in Intel's latest 90 nm and 65 mn generation logic technologies and discuss how circuit power limitations will change the way we scale transistors in the future.