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Electronic conduction in silicon phthalocyanine thin films

机译:硅酞菁薄膜中的电子传导

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Si-Phthalocyanines (SiPc) thin films were deposited on conductive substrates and their electronic properties were studied in sandwich-like Metal-SiPc-Metal structures. The current-voltage characteristics at different temperatures were determined. Aluminum and gold were used as electrode metals. For the Au-SiPc-Au structures, the J-V results were interpreted by using the space-charge-limited-conductivity theory and subsequently the trap density and hole mobility in the SiPc volume were determined. For the Al-SiPc-Al structure the J-V curves were analyzed based on the Schottky theory and the barrier height value for the Al-SiPc barrier was calculated. Moreover, the current density level flowing through the structure was depending on the polarization (forward o reverse) applied to the structure. This effect was attributed to the possible existence of an oxide at the interface between the top electrode and the SiPc.
机译:Si-酞菁(SIPC)薄膜沉积在导电底物上,并在夹层状金属-SiPC-金属结构中研究了它们的电子性质。确定不同温度下的电流电压特性。铝和金用作电极金属。对于AU-SIPC-AU结构,通过使用空间电荷限制导电性理论并随后测定SIPC体积中的陷阱密度和空穴迁移率来解释J-V结果。对于Al-SIPC-AL结构,基于肖特基理论分析了J-V曲线,并计算了AL-SIPC屏障的阻挡高度值。此外,流过结构的电流密度水平取决于施加到该结构的偏振(正向O反向)。这种效果归因于顶电极和SIPC之间的界面处的氧化物的可能存在。

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