首页> 外文会议>Society of Photo-Optical Instrumentation Engineers Conference on Advances in Optical Thin Films >Radiation resistance of single and multilayer coatings against synchrotron radiation
【24h】

Radiation resistance of single and multilayer coatings against synchrotron radiation

机译:单层和多层涂层对同步辐射的辐射抗性

获取原文

摘要

Optical coatings for the use in free electron laser systems have to withstand high power laser radiation and the intense energetic background radiation of the synchrotron radiation source. In general, the bombardment with high energetic photons leads to irreversible changes and a discoloration of the specimen. For the development of appropriate optical coatings, the degradation mechanisms of available optical materials have to be characterized. In this concribution the degradation mechanisms of single layer coatings (fluoride and oxide materials) and multilayer systems will be presented. Fluoride and oxide single layers were produced by thermal evaporation and high energetic ion beam sputter deposition. The same methods were employed for the deposition of multilayer systems. High reflecting coatings for the wavelength region around 180nm were chosen for the irradiation tests. All samples were characterized after production by spectrophotometry covering the VUV , VIS, and MIR spectral range. Mechanical coating stress was evaluated with interferometrie methods. Synchrotron irradiation tests were performed at ELETTRA, using a standardized irradiation cycle for all tests. Ambient pressure and possible contamination in the vacuum environment were monitored by mass spectrometry. For comparison, the optical coatings were investigated again in the VUV, VIS, and MIR spectral range after irradiation. On selected samples XRD measurements were performed. The observed degradation mechanisms comprise severe damages like coating and substrate surface ablation. Color centre formation in the VIS spectral range and an increase of VUV absorption were found as a major origin for a severe degradation of VUV transmittance On the basis of the performed investigations, a selection of coating materials and coating systems is possible in respect to the damage effects caused by synchrotron radiation.
机译:用于自由电子激光器系统的光学涂层必须承受高功率激光辐射和同步辐射源的强烈能量背景辐射。通常,具有高能量光子的轰击导致不可逆的变化和样品的变色。为了开发适当的光学涂层,必须表征可用光学材料的降解机制。在这种制度中,将提出单层涂层(氟化物和氧化物材料)和多层系统的降解机制。通过热蒸发和高能量离子束溅射沉积产生氟化物和氧化物单层。采用相同的方法来沉积多层系统。选择用于照射试验的高约180nm的波长区域的高反射涂层。通过分光光度法生产后表征所有样品,覆盖VUV,VIS和MIR光谱范围。用干扰素方法评价机械涂层应激。使用标准化的照射循环在EleTTRA进行同步辐射测试,用于所有测试。通过质谱法监测真空环境中的环境压力和可能的污染。为了比较,在照射后再次研究光学涂层,在VUV,VIS和MIR光谱范围内进行研究。在所选样品上进行XRD测量。观察到的降解机制包括涂层和基材表面消融等严重损伤。在VIS光谱范围内形成颜色中心形成和VuV吸收的增加是在进行进行的研究的基础上进行严重降解VUV透射率的主要原点,可以在损伤方面选择涂料和涂层系统同步辐射造成的效果。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号