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Development of Equipment and Technology in the Deposition of ITO and AR Coatings

机译:ITO和AR涂层沉积设备和技术的开发

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Three-drum and six-drum web equipment design and construction for the deposition of transparent/conductive coatings of ITO over a wide range of sheet resistance (from 10 to 500 Ohm/sq.), as well as of multilayer AR coatings are considered. The development of a multichamber vacuum machine has been carried out taking into account various technological methods for reactive deposition stabilization and for achievement of stable coating properties. For leveling initial surface conditions of the film prior to coating the film pretreatment is performed, which includes the film drying and outgassing in a special machine and its plasma activation in the vacuum coater. Stability of gained coatings parameters was ensured by using double-loop control system, applying emission spectra and both optical and electrical characteristics The technology of water vapors and carbon dioxide usage in the deposition process is developed. The water vapors, on one side, contribute to the deposition process stabilization, on the other hand, affect coating properties. The use of carbon dioxide instead of oxygen allows to expand the possibilities of web coating process monitoring.
机译:三滚筒和六鼓网络设备的设计和构造为ITO的透明/导电涂层的在宽范围内的薄层电阻的沉积(从10至500欧姆/平方。),以及多层AR涂层的被考虑。多室真空机的发展已经进行了考虑到了反应沉积稳定和稳定的涂层性质的成就帐户各种技术方法。用于涂覆薄膜的预处理中进行,它包括胶片干燥并在一个特殊的机器及其等离子体活化在真空涂布机脱气之前整平膜的初始表面状态。获得的涂层参数的稳定性通过使用双回路控制系统中,将发射光谱和光学和电学特性的水蒸汽和在沉积过程中二氧化碳的使用的技术被开发确保。水蒸汽,在一侧上,有助于沉积过程稳定,而另一方面,影响涂层性能。使用二氧化碳代替氧的允许扩大的卷绕涂布工艺监测的可能性。

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