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Electron-phonon heat transport in degenerate Si at low temperatures

机译:在低温下退化Si的电子 - 声子热传输

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The thermal conductance between electrons and phonons in a solid state system becomes comparatively weak at sub-Kelvin temperatures. In this work five batches of thin heavily doped silicon-on-insulator samples with the electron concentration in the range of 2.0-16 -1019 cm-3 were studied. Below 1 K all the samples were in the dirty limit of the thermal electron-phonon coupling, where the thermal phonon wavelength exceeds the electron mean free path. The heat flow between electrons and phonons is proportional to (T6e-T6ph), where Te (Tph) is the electron (phonon) temperature. The constant of proportionality of the heat flow strongly depends on the electron concentration and its magnitude is roughly two orders of magnitude smaller than in normal metals like Cu. These properties of degenerate Si make it promising material for many low temperature device applications.
机译:在亚开尔文温度下,固态系统中的电子和声子之间的热传导变得相对较弱。在这项工作中,研究了五批薄的薄掺杂硅环内绝缘体样品,其电子浓度在2.0-16 -1019cm-3的范围内。在1 k以下,所有样品都处于热电子 - 声子耦合的脏极限,其中热声波隆波长超过电子平均自由路径。电子和声子之间的热流与(T6E-T6PH)成比例,其中Te(TPH)是电子(声子)温度。热流的比例常数强烈地取决于电子浓度,并且其幅度大约比Cu等正常金属小的两个数量级。退化Si的这些性质使其具有许多低温装置应用的有希望的材料。

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