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Deposition dependence of zirconium tungstate (ZrW2O8) based negative thermal expansion films for optical coatings

机译:锆钨酸锆(ZrW2O8)的光学涂层负热膨胀膜的沉积依赖性

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摘要

Zirconium tungstate-based thin films have been deposited with positive and negative thermal expansion coefficients, where the type of exp ansion appears to be critically dependent on the film density. Film deposition and characterization is presented.
机译:锆钨基薄膜已经沉积有正极和负热膨胀系数,其中exp附带的类型似乎是尺寸依赖于膜密度。提出了薄膜沉积和表征。

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