In this paper, we describe using high transmission nanoscale apertures of C and H shapes for nanolithography applications. We demonstrate that these ridge apertures provide a highly localized and intense light spot that can be used in lithography experiments. Near-field optical lithography comes under the category of scanning probe technologies proposed for overcoming the diffraction limit that is encountered in traditional optical lithography. Some of the near-field techniques involve illuminating a thin resist layer by light emitted either from the tip of a metal coated optical fiber or from regular shaped apertures. The main drawbacks of these approaches are that the process is a serial one and/or the transmission efficiency of the apertures is very low.
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