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Metal Diffusion and Surface Pattern Formation on GaAs and As_2S_3 Semiconductors

机译:GaAs和AS_2S_3半导体上的金属扩散和表面图案形成

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The possible changes of composition, phase transformations at the surface were investigated in GaAs samples, covered with 50 nm thick Au layer and annealed at different temperatures. Diffusion processes at metal-semiconductor interface determine the surface pattern formation, which has fractal structure. Comparison was made with interdiffusion processes in Au-amorphous As_2S_3 and Bi-As_2S_3 structures, which were found as useful for micro- and macroscopic surface relief formation, optical recording due to the additional photo-stimulated diffusion.
机译:在GaAs样品中研究了组合物的可能变化,表面转化,用50nm厚的Au层覆盖并在不同的温度下退火。金属半导体界面处的扩散过程确定了具有分形结构的表面图案形成。使用Au-Amorphous AS_2S_3和BI-AS_2S_3结构中的相互扩散过程进行了比较,该方法被发现是有用的微观和宏观表面浮雕形成,由于附加的光刺激扩散导致的光学记录。

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