Mass and energy spectra of ions have been measured in magnetron sputtering processes for indium tin oxide deposition. Targets were indium tin or indium tin oxide which have been sputtered either non-reactively (Ar) or reactively (Ar/O_2). Discharges in reactive atmosphere revealed the same results for both target materials. Non-reactive sputtering of the indium-tin-oxide target results in increased ion flux for the high-energetic negative oxygen, however with reduced energy due to lower discharge impedance. In contrast, the lower-energy part of negative ions is reduced in this case. High-energetic positive ions have been detected when oxygen is present in the target or gas. These are identified as charge-exchange products from negative ions.
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