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The temporal evolution of the ion bombarding energy at the substrate in a HiPIMS discharge

机译:在HIPIMS放电中衬底中的离子轰击能量的时间演变

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The time-resolved ion energy distribution functions (IEDF's) at the substrate position in a HiPIMS discharge were investigated using a commercial quadruple energy-resolved mass spectrometer, incorporating a double gating ion shuttering technique. A titanium target (Ti) was sputtered in argon gas at 0.54 Pa pressure, with an average power of 680W, a frequency of 100Hz and a pulse width of 100 (mu)s. The IEDF's show a peak in the Ar~(+) counts at the energy equivalent to the local plasma potential V_(p) (3V), however for Ti~(+) ions a similar peak was observed at 22 eV. The peaks for Ar~(+) ion counts occurred at times 30 (mu)s and 60 (mu)s after the initiation of the cathode discharge pulse (V_(d)). We speculate that the first peak, occurred at 30 (mu)s was due to electron impact ionization, whereas second peak, occurred at 60 (mu)s, was due to asymmetric charge exchange ionization mechanism.
机译:使用商业四倍能量分辨质谱仪研究了HIPIMS放电中的基板位置处的时分离子能量分布功能(IEDF),包括双门控离子快门技术。在0.54Pa压力下在氩气中溅射钛靶(TI),平均功率为680W,频率为100Hz,脉冲宽度为100(mu)。 IEDF的峰值在AR〜(+)计数中的峰值在等于局部等离子体电位V_(3V)的能量,然而,对于Ti〜(+)离子在22例中观察到类似的峰。在阴极放电脉冲开始之后,在30(mu)和60(mu)和60(mu)s中发生Ar〜(+)离子计数的峰值(V_(d))。我们推测,在30(mu)S时发生的第一峰是由于电子碰撞电离,而第二峰在60(mu)时,由于不对称的电荷交换电离机制。

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