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Femto-attosecond photoelectronic imaging (the present state of the art and new trends)

机译:Femto-Attosecond光电成像(现有技术和新趋势)

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Basic advantages and limitations of ultrafast photoelectronic imaging are overviewed. Presented are recent experimental results on recording of Ti: sapphire laser radiation with 200-fs time resolution and 30-line pairs/mm spatial resolution. Some peculiarities in displaying of ultrafast optical events onto the photocathode with femtosecond precision are shortly mentioned. Special emphasis is given to creation of ultra high (10-100kV/mm) electrical field strength nearby the photocathode surface, as well as to manufacturing various types of femtosecond image converter tubes. To break the femtosecond barrier, a new technique for generation the attosecond bunches of tens keV electrons in quasistationary electromagnetic fields is proposed.
机译:概述了超快速光电成像的基本优点和局限性。提出是最近关于Ti的记录的实验结果:蓝宝石激光辐射,200-FS时间分辨率和30线对/ mm空间分辨率。不久提到,在用飞秒精度显示在光电阴极上的一些特殊性。特别强调在光电阴极表面附近的超高(10-100kV / mm)电场强度的创建,以及制造各种类型的飞秒图像转换管。为了打破飞秒屏障,提出了一种新技术,用于在额定电磁场中产生数十keV电子的attoSecond串。

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