HIGH PRECISION INSTRUMENT FOR MICRO SURFACE PROFILEMEASUREMENT BASED ON OPTICAL INVERSESCATTERING PHASE METHOD

摘要

With the advance of microtechnology, inprocess or in situ measurement techniques for measuring surface profiles of engineered micro parts have been increasingly required. We have proposed an optical measurement technique, the optical inverse scattering phase method, which can be applied to the in-process measurement of micro-surface profile with the accuracy in the nanometer order. An instrument has been designed and developed on the basis of the proposed principles, and verified by measuring an ultra precision grid plate having rectangular pockets 44nm deep at intervals of 10μm. The measured surface profile gave good agreement with the nominal dimensions of the specimen as well as the one obtained by AFM.