Arendiazonium tosylates as new, available and convenient reagents for the formation of organic layers on carbon surfaces

摘要

It has been well known that one of the most effective methods for the covalent surface modification of carbon, metal, and semiconductors is through the use of diazonium compounds. Commonly arenediazonium ions are chemically or electrochemically reduced into radicals that covalently attach to carbon, metal, and silicon surfaces, forming covalently bonded dense functional layers. However, the usual arenediazonium salts are unstable and potentially hazardous or hard soluble in water and other common solvents.