首页> 外文会议>International symposium on magnetic materials, processes, and devices with applications in storage and micro-electro-mechanical systems >Electrodeposition of aluminum-vanadium alloys from the aluminum chloride-1-ethyl-3-methylimidazolium chloride molten salt
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Electrodeposition of aluminum-vanadium alloys from the aluminum chloride-1-ethyl-3-methylimidazolium chloride molten salt

机译:铝 - 钒合金的电沉积来自氯化铝-1-乙基-3-甲基咪唑氯化盐的氯化盐

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The electrodeposition of Al-V alloys was investigated in the VCl_2-saturated 66.7-33.3 mole percent aluminum chloride-1-ethyl-3-methylimidazolium chloride molten salt at 353 K. Because the reduction of V(II) occurs at potentials considerably negative of the Al(III)/Al electrode reaction, Al-V alloys cannot be electrodeposited from this melt without the use of the additive, 1-ethyl-3-methylimidazolium tetrafluoroborate. In the presence of this additive, the vanadium content of electrodeposited alloys increased with increasing cathodic current density or more negative applied potentials. X-ray analysis of Al-V alloys that were electrodeposited on a rotating copper wire substrate indicated that these alloys did not form or contain an intermetallic compound, but were nonequilibrium or metastable solid solutions. The chloride-pitting corrosion properties of these alloys were examined in N_2-saturated aqueous NaCl by using a potentiodynamic polarization technique. Alloys containing ~10 a/o vanadium exhibited a pitting potential that was +0.3 V positive of that for pure aluminum. However, this pitting potential was inferior to that measured for aged Al-V alloys that were prepared by sputter deposition.
机译:在353k的VCL_2饱和66.7-33.3摩尔百分比氯化铝-1-乙基-3-甲基咪唑氯化铵熔盐中研究了Al-V合金的电沉积。因为v(ii)的还原在潜在负面Al(III)/ Al电极反应,在不使用添加剂,1-乙基-3-甲基咪唑鎓四氟硼硼酸盐的情况下不能从该熔体中电沉积,Al-V合金。在这种添加剂存在下,电沉积的合金的钒含量随着阴极电流密度或更负施加电位的增加而增加。在旋转铜线基板上电沉积的Al-V合金的X射线分析表明,这些合金没有形成或含有金属间化合物,但均匀或稳定的固体溶液。通过使用电位偏振技术在N_2饱和NaCl中检查这些合金的氯化物腐蚀性。含有〜10A / O钒的合金表现出纯铝的达0.3V阳性的蚀力。然而,这种点击电位差不等于通过溅射沉积制备的老年Al-V合金测量。

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