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首页> 外文期刊>Journal of Mining and Metallurgy, Section B: Metallurgy >Electrochemistry of vanadium(II) and the electrodeposition of aluminum-vanadium alloys in the aluminum chloride-1-ethyl-3-methylimidazolium chloride molten salt
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Electrochemistry of vanadium(II) and the electrodeposition of aluminum-vanadium alloys in the aluminum chloride-1-ethyl-3-methylimidazolium chloride molten salt

机译:钒(II)的电化学和铝钒合金在氯化铝-1-乙基-3-甲基咪唑鎓氯化物熔融盐中的电沉积

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The electrochemical behavior of vanadium(II) was examined in the 66.7-33.3 mole percent aluminum chloride-1-ethyl-3-methylimidazolium chloride molten salt containing dissolved VCl2 at 353 K. Voltammetry experiments revealed that V(II) could be electrochemically oxidized to V(III) and V(IV). However at slow scan rates the V(II)/V(III) electrode reaction is complicated by the rapid precipitation of V(III) as VCl3. The reduction of V(II) occurs at potentials considerably negative of the Al(III)/Al electrode reaction, and Al-V alloys cannot be electrodeposited from this melt. However electrodeposition experiments conducted in VCl2-saturated melt containing the additive, 1-ethyl-3-methylimidazolium tetrafluoroborate, resulted in Al-V alloys. The vanadium content of these alloys increased with increasing cathodic current density or more negative applied potentials. X-ray analysis of Al-V alloys that were electrodeposited on a rotating copper wire substrate indicated that these alloys did not form or contain an intermetallic compound, but were non-equilibrium or metastable solid solutions. The chloride-pitting corrosion properties of these alloys were examined in aqueous NaCl by using potentiodynamic polarization techniques. Alloys containing ~10 a/o vanadium exhibited a pitting potential that was 0.3 V positive of that for pure aluminum.
机译:在353 K下,在溶解的VCl2的66.7-33.3摩尔%的氯化铝-1-乙基-3-甲基咪唑氯化铝熔融盐中研究了钒(II)的电化学行为。伏安法实验表明,V(II)可以被电化学氧化为V(III)和V(IV)。然而,在缓慢的扫描速率下,V(II)/ V(III)电极反应由于V(III)作为VCl3的快速沉淀而变得复杂。 V(II)的还原发生在Al(III)/ Al电极反应的负电势很大,并且Al-V合金无法从该熔体中电沉积。但是,在含有添加剂1-乙基-3-甲基咪唑鎓四氟硼酸盐的VCl2饱和熔体中进行的电沉积实验产生了Al-V合金。这些合金中的钒含量随着阴极电流密度的增加或施加的负电势的增加而增加。电沉积在旋转铜线基材上的Al-V合金的X射线分析表明,这些合金不形成或不包含金属间化合物,而是非平衡或亚稳态固溶体。通过使用电位动力学极化技术,在NaCl水溶液中检查了这些合金的氯化物点蚀性能。含〜10 a / o钒的合金的点蚀电位为纯铝的0.3 V正。

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