Generation of soft x-rays and extreme ultraviolet (EUV) radiation using a laser-irradiated gas puff target

摘要

Investigations on soft x-ray and extreme ultraviolet (EUV) emissions from a gas puff target irradiated with high-power laser pulses are presented. The aim of the studies is to develop efficient and debris-free laser plasma x-ray and EUV sources for applications in microscopy, lithography and microtechnology. Recent studies on soft x-ray and EUV lasers generated using an elongated gas puff target irradiated with picosecond pulses are presented as well.