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In(0.53)Gao(0.47)As/InP conventional and inverted thermophotovoltaic cells with back surface reflector

机译:在(0.53)GAO(0.47)中为/ InP常规和倒炎热聚电池,背面反射器

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Characteristics of conventional and inverted InGaAs/InP thermophotovoltaic (TPV) cells with a back surface reflector (BSR) fabricated on electrically active n-type InP substrates are presented. Thermophotovoltaic cells based on lattice matched InP-In0.53Ga0.47As heterostructures were fabricated with the use of LPE and Zn,P diffusion technologies. In the p-n TPV cells (conventional type, spectral range 600 divided by 1800 nm) with a frontal p-InGaAs layer, BSR was made on a n-InP substrate. In the n-p structure (inverted type, spectral range 1000-1800 mn) with a frontal bulk n-InP-window-substrate, BSR was formed on a p-InGaAs layer. Antireflection coating (ARC) on the frontal cell surface consists of ZnS/MgF2 layers. Results of investigation of sub-bangap photons reflection from InP substrates with a backside MgF2/Au mirror in the range of 1800 divided by 2000nm are described. The reflection of BSR for InP samples with the doping level in the range of 1x10(17) divided by 6x10(18)cm(-3) evidenced a weak dependence on their thickness and doping level. A reflection of 86 divided by 90% has been measured for substrates 100 mu m thick and 80% for ones 400 mu m thick with ARC. Study of sub-bandgap photon reflection of p-InGaAs (Zn,P) layers with surface concentration of 1 divided by 3x10(19)cm(-3) has been also carried out. A reflection of 68 divided by 77% for 2 divided by 4 mu m layers with "hybrid" (ohmic contact plus mirror) back-surface reflector consisted of deposited Cr/Au layers was measured. It was found, that p-n and n-p thermophotovoltaic 1x1cm(2) Cells with identical grid design reveal similar parameters for up to 1A/cm(2) current density (V-OC=465mV and FF=64%) and the 76 divided by 80% reflection of the sub-bandgap photons for wavelengths longer than 1.86 mu m. The developed inverted InGaAs TPV cells have been tested under illumination of silicon carbide high temperature emitter. The photocurrent density J(sc)=7A/cm(2), open circuit voltage V-oc=0.476V and fill factor FF=0.691 have been measured in the inverted (without BSR) InGaAs cell under SiC emitter heated to the temperature of about 1550 degrees C. Both types of devices can successfully be used as TPV cells for conversion of radiation in the range of 1500-1900K, with 14-15% efficiency.
机译:呈现了在电活性N型InP基板上制造的背面反射器(BSR)的常规和倒立的InGaAs / InP炎热球(TPV)电池的特性。使用LPE和Zn,P扩散技术,制备基于晶格匹配的晶格匹配的丙位型电池。在具有前部p-IngaAs层的P-N TPV电池(常规类型,谱范围600除以1800nm)中,在N-InP衬底上制备BSR。在N-P结构(倒置式,光谱范围1000-1800mN)中,具有正面散装N-InP窗衬底,在P-InGaAs层上形成BSR。前部电池表面上的抗反射涂层(弧)由ZnS / MgF2层组成。描述了从INP衬底与背面MGF2 / Au镜在1800除以2000nm的范围内的INP基板的反射的研究结果。 BSR对INP样品的反射在1×10(17)的范围内除以6×10(18)厘米(-3),证明了对它们的厚度和掺杂水平的弱依赖性。对于80%的基板,86分除了90%的反射,对于电弧400μm厚的40%,测量了80%。还进行了研究P-InGaAs(Zn,P)层的副带隙光子反射,其表面浓度除以3×10(19)cm(-3)。测量了由沉积的Cr / Au层组成的“混合”(欧姆接触加镜)后表面反射器的4μm层除以2μm层的77%。发现,Pn和NP炎散热物1x1cm(2)具有相同网格设计的电池,揭示了高达1a / cm(2)电流密度(V-oc = 465mV和ff = 64%)的类似参数,并且76除以80子带隙光子的百分比对波长长于1.86μm的波长。在碳化硅高温发射器的照明下已经测试了发育的倒置的InGaAs TPV电池。光电流密度j(sc)= 7a / cm(2),打开电路电压V-oc = 0.476V和填充因子ff = 0.691已经在倒置(没有BSR)Ingaas细胞下在加热到温度下测量大约1550℃。两种类型的设备都可以成功用作TPV电池,用于转换辐射的范围为1500-1900K,效率为14-15%。

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