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Calibration of nanotransducer by a monolithic x-ray interferometer

机译:单片X射线干涉仪校准纳米转展料

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A monolithic x-ray interferometer manufactured at KRISS has been used to provide a means for the calibration of transducers with the traceability to the standards of length in the sub-nanometer region. Such calibration by the monolithic x-ray interferometer using the lattice spacing of silicon is directly traceable to primary standards. The lattice plane used for diffraction was (220) with lattice parameter of 0.192 nm. One period of the x-ray interference fringe corresponds to the lattice parameter. We could achieve a resolution of less than 0.01 nm by detecting the phase of the x-ray interference signal. A monolithic x-ray interferometer was made from a silicon single crystal. It comprises three thin lamellas called splitter, mirror, and analyzer, and it incorporates a double parallel spring structure for the translation of the analyzer lamella. The x-ray interferometer has been applied to the measurements of displacements at sub-nanometer levels. The displacements of linear transducers have been measured using the x-ray interferometer. Several capacitive sensors were also calibrated and the results of these measurements are reported in the paper.
机译:在Kriss制造的单片X射线干涉仪已经用于提供用于校准换能器的换能器,以可追溯到子纳米区域中的长度标准。通过使用硅片间距的整体X射线干涉仪的这种校准直接可追溯到主要标准。用于衍射的晶格平面为(220),晶格参数为0.192nm。 X射线干涉条纹的一个时段对应于晶格参数。通过检测X射线干扰信号的相位,我们可以实现小于0.01nm的分辨率。由硅单晶制成单片X射线干涉仪。它包括三个称为分配器,镜子和分析仪的三个薄薄的薄片,它包括双平行的弹簧结构,用于翻译分析仪薄片。 X射线干涉仪已应用于子纳米水平的位移的测量。使用X射线干涉仪测量线性换能器的位移。还校准了几种电容传感器,并在纸上报道了这些测量结果。

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