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Z-Interconnect Technology - A Reliable, Cost Efficient Solution for High Density, High Performance Electronic Packaging

机译:Z-Interconnect技术 - 用于高密度,高性能电子包装的可靠,高效的解决方案

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Common themes across all segments of electronic packaging today are density and performance. High density interconnect (HDI) technology is one of the most commonly utilized methods for electronic package density improvement, while many different areas have been investigated for performance improvement, from low loss dielectric and conductor materials, to via design and via stub reduction. Electrical performance and density requirements are sometimes complementary, but often times, conflicting with one another. This paper will describe the design, materials, fabrication, and reliability of a new Z-Interconnect technology that addresses both high density and high performance demands simultaneously. Z-Interconnect technology uses an electrically conductive adhesive to electrically interconnect several cores (Full Z) or sub-composites (Sub Z) in a single lamination process. Z-Interconnect technology will be compared and contrasted to other commonly used solutions to the performance and density challenges. HDI or sequential build-up technology is a pervasive solution to the density demands in semiconductor packaging and consumer electronics (e.g. Smart phones), but has not caught hold in HPC or A&D printed wiring board (PWB) applications. One solution for PWB electrical performance enhancement is plated through hole (PTH) stub reduction by "back drilling" the unwanted portion of the PTH. Pb-free reflow and Current Induced Thermal Cycling (CITC) test results of product coupons and specially designed test vehicles, having component pitches down to 0.4mm, will be presented. Z-Interconnect test vehicles have survived 6X Pb-free (260C) reflow cycles, followed by greater than 3000 cycles of 23C-150C CITC cycles. Test vehicle and product coupons also easily survive 10 or more 23C-260C CITC cycles.
机译:今天电子包装段的共同主题是密度和性能。高密度互连(HDI)技术是用于电子封装密度改善的最常用的方法之一,而已经研究了许多不同的区域以从低损耗介质和导体材料,通过设计和通过短管减少来进行性能改善。电气性能和密度要求有时是互补的,但通常是彼此冲突。本文将描述新的Z互连技术的设计,材料,制造和可靠性,同时解决高密度和高性能需求。 Z-互连技术使用导电粘合剂在单个层压过程中电导电粘合剂电互连几个芯(全Z)或副复合材料(亚Z)。将Z互连技术与其他常用的解决方案进行比较,对性能和密度挑战的比较。 HDI或顺序建设技术是普遍的解决方案,对半导体封装和消费电子产品(例如智能手机)中的密度需求的解决方案,但在HPC或A&D印刷线路板(PWB)应用中没有捕获。 PWB电气性能增强的一个解决方案通过“返回钻孔”PTH的不需要的部分来通过孔(PTH)短截线。将提出无铅回流和电流诱导的热循环(CITC)测试产品的产品优惠券和专门设计的测试车辆,将具有下降至0.4mm的部件间距。 Z-互连试验车辆存活了6倍的无铅(260℃)的回流循环,然后大于3000次的23C-150C CITC循环循环。测试车辆和产品优惠券也容易存活10个或更多的23C-260C Citc循环。

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