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Orange GaInN/GaN Multi-Quantum-Well Light-Emitting Diodes using a Post-Annealing Technique

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The GaInN/GaN multi-quantum-well orange light-emitting diodes (LEDs) were grown by metalorganic chemical vapor deposition on sapphire substrates using a post-growth-annealing technique. The Mg-doped GaN layer was grown at a relatively low growth temperature of 900°C in order to avoid the thermal decomposition of indium-rich GaInN multi-quantum-well (MQW) structure during the Mg-doped GaN growth. After the growth, post-growth-annealing at 1000°C was performed to rectify the poor crystalline quality of Mg-doped GaN layer and make longer wavelength. The post-growth-annealed MQW LED showed a peak wavelength of 630 nm.
机译:使用后生长退火技术,通过在蓝宝石基材上的金属化学气相沉积来生长Gainn / GaN多量子阱橙色发光二极管(LED)。在900℃的相对低的生长温度下生长Mg掺杂的GaN层,以避免在Mg掺杂GaN生长期间富含富含铟的增益多量子阱(MQW)结构的热分解。在生长之后,进行1000℃的生长后退火以液化Mg掺杂GaN层的差的结晶质量并使波长较长。后生长退火的MQW LED显示出630nm的峰值波长。

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