首页> 外文会议>European photovoltaic solar energy conference >ROLE OF INTERFACES AND HYDROGEN SUBSURFACE REACTIONS IN THE MICROSTRUCTURAL AND OPTICAL MODIFICATIONS OF CRYSTALLINE SILICON BASED HETEROJUNCTIONS BY SPECTROSCOPIC ELLIPSOMETRY
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ROLE OF INTERFACES AND HYDROGEN SUBSURFACE REACTIONS IN THE MICROSTRUCTURAL AND OPTICAL MODIFICATIONS OF CRYSTALLINE SILICON BASED HETEROJUNCTIONS BY SPECTROSCOPIC ELLIPSOMETRY

机译:界面和氢气表面反应在光谱椭圆形测定法中基于微结构和光学修饰中的作用和光学修饰

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In this work, we discuss the use of spectroscopic ellipsometry,which is a non-invasive and non-destructive technique with a sub-monolayer resolution, to study the structural modifications induced by hydrogen subsurface reactions in c-Si/a-Si:H/ITO heterostructures for solar cells. The samples have been prepared by e-beam deposition of an indium tin oxide (ITO) film on PECVD grown c-Si/a-Si:H heterojunctions. In this process, the c-Si/a-Si:H interface can be modified by hydrogen subsurface reactions during the initial stage of the a-Si:H film deposition, and the structural damage of this interface is enhanced during the post-annealing treatment of devices, which activates the out-diffusion of hydrogen from the a-Si:H layer into the underlying c-Si substrate. The hydrogen diffusion also causes a roughening of the a-Si/ITO interface and a decrease of the transparency and conductivity of the ITO film itself.
机译:在这项工作中,我们讨论了光谱椭圆形测定法的使用,即具有亚单层分辨率的非侵入性和非破坏性技术,以研究C-Si / A-Si:H中的氢地下反应诱导的结构修饰/ ITO太阳能电池异质结构。通过在PECVD生长C-Si / A-Si / A-Si:H杂交上的氧化铟锡(ITO)膜的氧化铟锡(ITO)膜的电子束沉积来制备样品。在该过程中,可以通过在A-Si:H膜沉积的初始阶段期间通过氢地下反应来修改C-Si / A-Si:H界面,并且在退火后,该界面的结构损坏增强对装置的处理,其激活来自A-Si:H层的氢气的外扩散到下面的C-Si衬底。氢气扩散也导致A-Si / ITO界面的粗糙化和ITO胶片本身的透明度和导电性的降低。

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