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Effect of Etch Tunnel Length Distribution on Frequency Dispersion of Pure Aluminium Foil Used for Aluminium Electrolytic Capacitor

机译:蚀刻隧道长度分布对铝电解电容器纯铝箔频分散的影响

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The present work involves the effect of etch tunnel length distribution on frequency dispersion of pure aluminium foil used for aluminium electrolytic capacitor by using scanning electron microscopy and electrochemical impedance spectroscopy. Etching was carried out under galvanostatic polarization as a function of etching time to control the etch tunnel length distribution. Then the specimen was anodized in a 0.5 M H_3BO_3 + 0.05 M Na_2B_4O_7 solution at 0.5 mAcm~(-2) up to 50 V and held at 50 V for a further 30 min. The etch tunnel length distributions were characterized roughly with the help of scanning electron microscopy after dissolving aluminium by immersing in a bromine-methanol solution. In the present work, transmission line model was modified taking into account the presence of the length distribution of aluminium etch tunnels on the assumption that fraction of tunnels dying per unit time holds constant. From the experimental results, it was revealed that the tunnel length was more widely distributed with increasing etching time. At the same time, the similar trend in shape was also observed between the impedance spectra experimentally measured and those spectra numerically simulated, indicating that the impedance spectra of the anodized aluminium foil can be analysed on the basis of the transmission line model.
机译:本作本作品涉及蚀刻隧道长度分布对铝电解电容器用于铝电解电容器的纯铝箔的频率分散的影响,采用扫描电子显微镜和电化学阻抗光谱。根据蚀刻时间以控制蚀刻隧道长度分布的函数,在蚀刻偏振下进行蚀刻。然后将试样在0.5mMM〜(-2)的0.5M H_3BO_3 + 0.05MNA_2B_4O_7溶液中阳极氧化,高达50V至50V,并在50V中再保持30分钟。通过浸入溴 - 甲醇溶液中溶解铝后,蚀刻隧道长度分布在扫描电子显微镜后粗略地表征。在目前的工作中,考虑到铝蚀刻隧道的长度分布的情况下,修改了传输线模型在假设每单位时间的隧道分数保持恒定的情况下保持恒定。从实验结果中,揭示了隧道长度随着蚀刻时间的增加而分布。同时,在实验测量的阻抗光谱和数值上模拟的那些光谱之间也观察到类似的形状趋势,表明可以基于传输线模型分析阳极氧化铝箔的阻抗光谱。

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