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STUDIES OF ELECTRODEPOSITION OF SILANE FILMS ON METALS FOR CORROSION PROTECTION

机译:腐蚀保护金属硅烷薄膜电沉积研究

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In this paper, three types of protective silane films, Methyltrimethoxysilane (MTMS), Vinyltrimethoxysilane (VTMS), and Dodecyltrimethoxysilane (DTMS) were prepared on aluminum alloys LY12 by electrodeposition technique. The Reflection-Absorption Fourier Transform IR (FTRA-IR) measurements showed that, the silane films were successfully deposited through the chemical bonding between silane agents and Al alloys. electrochemical impedance spectroscopy (EIS) tests indicated that in comparison with those by conventional "dip-coating" method, silane films prepared at cathodic potentials exhibited obviously higher corrosion resistances. "Critical potential" was generally observed for each silane system. Silane films prepared at this potential performed the highest corrosion resistance. The scanning electron microscopy (SEM) images indicated a potential dependence of surface morphology of silane films. The highest compactness was obtained at the "critical potential". Due to the presence of long hydrophobic Dodecyl chain in bone structure, DTMS films displayed the best barrier properties.
机译:本文通过电沉积技术在铝合金LY12上制备三种类型的保护性硅烷膜,甲基三甲氧基硅烷(MTMS),乙烯基三甲氧基硅烷(VTMS)和十二烷基三甲氧基硅烷(DTMS)。反射吸收傅里叶变换IR(FTRA-IR)测量表明,通过硅烷试剂和Al合金之间的化学键合成功沉积硅烷膜。电化学阻抗光谱(EIS)试验表明,与常规“浸涂”方法相比,在阴极电位上制备的硅烷膜显着呈现出明显更高的耐腐蚀性。对于每个硅烷系统,通常观察到“临界电位”。在该电位制备的硅烷膜进行了最高的耐腐蚀性。扫描电子显微镜(SEM)图像表明硅烷膜表面形态的电位依赖性。在“临界潜力”中获得的最高紧凑性。由于骨结构中存在长疏水性十二烷基链,DTM薄膜显示出最佳的阻隔性能。

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