首页> 外文会议>International Workshop on the Physics of Semiconductor Devices >Optical Study of a-Ge_5Se_(95-x)Te_x: Effect of Crystallization
【24h】

Optical Study of a-Ge_5Se_(95-x)Te_x: Effect of Crystallization

机译:A-GE_5SE_(95-X)TE_X的光学研究:结晶的影响

获取原文

摘要

Amorphous Ge_5Se_(95-x)Te_x (where x = 0, 2, 5 and 10) thin films deposited by thermal evaporation were annealed at different temperatures below their crystallization temperatures. The optical band gap has been studied of as-deposited and annealed films as a function of photon energy in the wave length range (400 - 900 nm). It has been found that the optical band gap increases with increasing annealing temperatures and on Te concentration in the present system. For as-deposited films: it has been found that refractive index (n) and the extinction coefficient (k) increases on incorporation of tellurium in Ge-Se system.
机译:通过热蒸发沉积的沉积在其结晶温度以下的不同温度下退火,在其结晶温度下沉积的非晶Ge_5se_(95-x)Te_x(其中x = 0,2,5和10)。已经研究了光学带隙的沉积和退火薄膜,作为波长范围(400-900nm)的光子能量的函数。已经发现,光带间隙随着退火温度和本系统中的TE浓度而增加。对于沉积的薄膜:已经发现折射率(N)和消光系数(K)增加了Ge-SE系统中碲的掺入。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号