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Failure Mechanisms and Mechanical Characterization of Reactive Bonded Interfaces

机译:反应粘合界面的失效机制与机械表征

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This study presents results of microstructure diagnostics and mechanical strength investigations for reactive bonded components. For this purpose silicon (Si) test specimen were bonded by using commercially available 40 μm thick nickel/aluminum (Ni/Al) NanoFoils with a 10 μm thick tin (Sn) solder layer on both sides. Scanning electron (SEM) and high resolution transmission electron microscopy (HRTEM) in combination with energy dispersive X-ray spectroscopy (EDXS) at the bond interface showed the formation of silver-copper-tin (Ag-Cu-Sn) and tin-silver (Sn-Ag) intermetallics within the Sn solder matrix. The hardness and elastic modulus of the solder layer were characterized by nano indentation testing with a Berkovich indenter. Results from strength investigations using tensile and micro chevron testing revealed a strong bonding strength of the interface. SEM analyses of the fracture surfaces showed both, cohesive failure through the solder layer and adhesive failure between the silicon substrate and the gold-chrome coating layer.
机译:本研究提出了用于反应键合成分的微观结构诊断和机械强度研究的结果。为此目的,硅(Si)试样通过在两侧使用具有10μm厚的锡(Sn)焊料层的市售40μm厚的镍/铝(Ni / Al)纳米箔键合。粘合界面的扫描电子(SEM)和高分辨率透射电子显微镜(HRTEM)与能量分散X射线光谱(EDX)组合的粘合界面显示了银 - 铜 - 锡(Ag-Cu-Sn)和锡银(SN-AG)SN焊料矩阵内的金属间金属间金属间金属间金属间金属间金属间金属间金属间金属间金属间金属间金属间金属间金属间金属间金属间隙。焊料层的硬度和弹性模量通过纳米凹口测试用Berkovich Indenter进行了特征。使用拉伸和微驱试验强度调查的结果显示界面的强粘接强度。断裂表面的SEM分析通过焊料层和硅衬底和金铬涂层之间的粘合剂破坏显示。

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