Practical Lessons In Using Fourier Transform Infrared Spectroscopy To Monitor Industrial Process Exhaust ases

摘要

Advanced Micro Devices, Inc. (AMD) in Austin, Texas uses Fourier transform infrared (FTIR) spectroscopy to monitor process exhaust and air emissions from two semiconductor fabrication facilities. FTIR methods for analyzing ammonia, hydrogen fluoride, hydrogen chloride, and various organic solvent and fluorocarbons have been developed and used to monitor various aspects of the semiconductor manufacturing process for over two years. This paper describes the practical lessons learned and discusses techniques that were developed to improve the accuracy and reliability of monitoring industrial process exhaust using FTIR. The purpose of this paper is to present information that may be helpful to others engaging in FTIR exhaust monitoring, including a discussion of sampling techniques and equipment, maintenance issues, data management and interpretation, and improvements in spectral quantification methods.