The effect of Marangoni convection in solid/gas/liquid interphase with the vapor dissolution

摘要

Reduction of metallic impurities and an other contaminants on silicon wafers is one of the most important requirements for the manufacturing semiconductors, and the cleaning, rinsing and drying process are key technology for controlling such contaminations on the wafers. A new drying technique, called Marangoni drying, which is based on the Marangoni flow, has been proposed by Leenaars et. al. and they have demonstrated that this drying process added no contamination on a substrate surface compared for an another system. In this report, local concentration of organic solvent close to meniscus was performed and the proposed mechanism for Marangoni drying process was modified.