Scale-space and multi-resolution techniques for outlier analysis in surface metrology

摘要

This paper has demonstrated the use of morphological filters and wavelets for outlier analysis. While multi-resolution analysis partitions a signal into many bands with very high computational speeds, scale-space approach is computationally expensive. Faster algorithms are available for line structuring elements that enhance speed considerably. Scale-space seems to provide better valley separation with limited edge effects along the valleys.