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NanoBond: Target Bonding for Optimum Sputtering Performance

机译:Nanobond:目标粘合以获得最佳的溅射性能

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NanoBond~R offers an improved method for bonding sputtering targets to backing plates. It utilizes a metallic foil, NanoFoil~R, to generate localized heating during bonding. The heat is so precisely controlled that, while it is sufficient to reflow solder layers, it does not heat up the target or backing plate. Stress-free bonding of any combination of materials using high melting temperature solder is therefore possible. NanoBond thus offers many advantages compared to conventional bonding processes.
机译:Nanobond〜R提供了一种改进的方法,用于将溅射靶粘合到板板上。它利用金属箔,纳米油〜R,在粘合期间产生局部加热。如此精确地控制热量,虽然它足以回流焊料层,但它不会加热靶或背板。因此,可以使用使用高熔点温度焊料的任何材料组合的无应力键合。与传统的粘合工艺相比,纳米纳米提供了许多优点。

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