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Preparation and characterization of ferroelectric YMnO/sub 3/ thin film

机译:铁电YMNO / SUB 3 /薄膜的制备与表征

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Preferential (0004) oriented ferroelectric YMnO/sub 3/ thin films were prepared on Si substrates using inorganic precursors by sol-gel method. x-ray diffraction (XRD) measurement was used to find out suitable processing temperature. A 0.4 volt C-V window was obtained for the MFS structure at room temperature. And a wider C-V window of 0.8 volt was obtained at 200 K. Also Rutherford Backscattering Spectrometry (RBS) and AFM were used to characterize the films.
机译:优于优先(0004)取向的铁电Ymno / sub 3 /薄膜,使用溶胶 - 凝胶法使用无机前体在Si底物上制备。 X射线衍射(XRD)测量用于找出合适的加工温度。在室温下为MFS结构获得0.4伏C-V窗。在200k,获得了0.8伏的更宽的C-V窗口。还可以使用Rutherford反向散射光谱(RBS)和AFM来表征薄膜。

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