首页> 外文会议>IEEE International Symposium on Applications of Ferroelectrics >Structural and dielectric characterization of SrTio/sub 3/ and BST thin films for microwave applications
【24h】

Structural and dielectric characterization of SrTio/sub 3/ and BST thin films for microwave applications

机译:用于微波应用的SRTIO / SUB 3 / AND BST薄膜的结构和介电表征

获取原文

摘要

Heteroepitaxial SrTiO/sub 3/ and polycrystalline Ba/sub (1-x)/Sr/sub x/TiO/sub 3/ (x = 0.35, 0.40, 0.50) thin films (/spl sim/300 nm) were deposited on [100] oriented LaAlO/sub 3/ single crystal substrates by pulsed laser deposition using a KrF excimer laser (/spl lambda/ = 248 nm). RBS, XRD, FESEK and AFM were used for structural characterization. The stoichiometry was found to be closest to ideal at higher temperatures around 750/spl deg/C. The SrTiO/sub 3/ films were confirmed to be epitaxial with XRD omega scans, while the BST films were polycrystalline. The permittivity and loss tangent of the films were measured in the range of 1 kHz to 1 MHz. Both materials showed a high dielectric constant 230 for ST and around 800 for BST at room temperature, with losses on the order of a few percent. The tunability of BST was also measured and found to be up to 35%, depending on composition. In addition, correlations between film morphology, processing conditions, and stoichiometry are discussed.
机译:异胃部SRTIO / sub 3 /和多晶体Ba / sub(1-x)/ sr / su / su / x / tiO / sub 3 /(x = 0.35,0.40,0.50)薄膜(/ spl sim / 300nm)沉积在[ 100]通过使用KRF准分子激光(/ SPL Lambda / = 248nm),通过脉冲激光沉积取向拉马/亚3 /单晶基板。 RBS,XRD,Fesek和AFM用于结构表征。发现化学计量最接近750 / SPL DEG / C的较高温度最接近理想。 SRTIO / SUB 3 /薄膜被证实与XRD Omega扫描外延,而BST薄膜是多晶的。薄膜的介电常数和损耗在1kHz至1MHz的范围内测量。两种材料在室温下为ST和BST大约800显示了高介电常数230,损耗大约百分之几。根据组合物,还测量了BST的可调节性,发现高达35%。另外,讨论了薄膜形态,加工条件和化学计量之间的相关性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号