Resists Based on Hyperbranched Polyesters for Microlens Array Fabrication

摘要

Three-component photoresists were prepared from hyperbranched polyester, multifunctional acrylate monomers and photoinitiator. The hyperbranched resin had ―COOH, -OH and methacryloxy groups on their chain ends. The dried resist on glass substrate showed H～ HB pencil hardness. Sensitivity and contrast upon UV exposure were tunable by development solution and the amount of photoinitiator. In a case, high sensitivity with E_0 ～5.5 mJ/cm~2 and high contrast with γ～8 were obtained for resist exposed with a mixed UV light and developed with TMAH aqueous. The resist exhibited a unique linear relationship on exposure time with etching depth. This property provided a controlling of surface profile of micro optical elements fabricated with photoresists. Microlens arrays (200x200 μm) were prepared with a moving-mask using this photoresist.