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RECENT ADVANCES IN PULSE POWER SUPPLY TECHNOLOGY PLATING CAPABILITY

机译:脉冲电源技术和电镀能力的最新进展

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Pulse, Pulse Reverse and Pulsed wave sequencing signals enable plating deposit properties which can not be attained by conventional DC. Although there are considerable rewards and advantages to applying non-DC wave forms to electro-chemical process, considerable care should be taken to select the proper Pulse Plating Power Supply and to dedicate the effort required to optimize and integrate the unit into the production process. If you are facing challenges in the deposit characteristics, part geometry or process cost & throughput, pulse plating, through its recent advances, may enable significant benefits for your shop.
机译:脉冲,脉冲反向和脉冲波测序信号使能镀沉沉积性能,其不能通过常规DC获得。虽然将非直流波形形式施加相当大的奖励和优势,但是应该采取相当大的小心选择适当的脉冲电力供电,并专注于优化和集成本机进入生产过程所需的努力。如果您面临存款特性,部分几何或过程成本和吞吐量,脉冲电镀,通过最近的进步,可以为您的商店提供显着的益处。

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