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Experimental Analysis and a New Theoretical Model for Anomalously High Ideality Factors (n 2.0) in GaN-based p-n Junction Diodes

机译:GaN基P-N结二极管异常高理论因素(N 2.0)的实验分析及其新的理论模型

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Diode ideality factors of 2.0-8.0 have been reported in GaN-based p-n junctions. These values are much higher than the expected values of 1.0-2.0 as per the Sah-Noyce-Shockley theory. We propose a fundamentally new model for the high ideality factors obtained in GaN-based diodes. This model is based on the effect of moderately doped unipolar heterojunctions as well as metal-semiconductor junctions in series with the p-n junction. A relation for the effective ideality factor of a system of junctions is developed. A detailed experimental study is performed on diodes fabricated from two different structures, a bulk GaN p-n junction structure and a p-n junction structure incorporating a p-type AlGaN/GaN superlattice. Bulk GaN p-n junction diode displays an ideality factor of 6.9, whereas the one with the superlattice structure displays an ideality factor of 4.0. In addition, device simulation results further strengthen the model by showing that moderately doped unipolar heterojunctions are rectifying and increase the effective ideality factor of a p-n junction structure.
机译:在基于GaN的P-N结中报告了2.0-8.0的二极管理想因子。根据SAH-NOYCE-SHOCKLEY理论,这些值远高于1.0-2.0的预期值。我们提出了一种基于GaN基二极管中获得的高理想因素的基本新模型。该模型基于中等掺杂的单极杂交以及与P-N结串联的金属半导体结的影响。开发了对交界系统的有效理想因子的关系。对由两种不同结构制造的二极管进行详细的实验研究,散装GaN P-N结结构和包含P型AlGaN / GaN超晶格的P-N结结构。散装GaN P-N结二极管显示6.9的理想因子,而具有超晶格结构的理想系数显示为4.0的理想因子。此外,设备模拟结果通过表明中间掺杂的单极杂功能进行了整流并增加了P-N结结构的有效理想因子的进一步加强了模型。

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