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The Effect of Deposition Parameters on Tensile Properties of Pulse-Plated Nanocrystalline Nickel

机译:沉积参数对脉冲镀纳米晶镍拉伸性能的影响

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The microstructure and tensile properties were investigated for pulse-pulse-plated naniocrystalline nickel electrodeposite prepared from an additive-free sulfamate-based solution. Square-wave cathodic current densities were varied from 25 to 75 mA/cm~2. The samples deposited at 25 mA/cm~2 showed the smallest grain size (d approx 12 nm), and the grain size was found to increase with increasing current densities. The grain size of the electrodeposits ranged form approximately 27 to 12 nm. Tensile results indicated that the yield strength of the specimens increased with decreasing grain size. Scanning electron microscopy revealed that all electrodeposits fractured through a ductile mechanism.
机译:研究了由无添加剂磺酸盐的溶液制备的脉冲镀覆纳米晶体镍电镀层的微观结构和拉伸性能。方波阴极电流密度从25-75mA / cm〜2变化。沉积在25mA / cm〜2时的样品显示最小的粒度(D大约12nm),发现晶粒尺寸随着电流密度的增加而增加。电沉积的晶粒尺寸范围为约27至12nm。拉伸结果表明,试样的屈服强度随着晶粒尺寸的降低而增加。扫描电子显微镜显示,所有电沉积物都通过延性机制破裂。

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